Veröffentlichungsdatum: 23 Januar 2003
Projektträger – zwischengeschaltetes Finanzinstitut
Three major players in the photomask, microprocessor and memory chip industry, who form a joint venture for applied research and development and a pilot production facility for advanced photomasks.Ort
Beschreibung
This project comprises the green-field development of a new photomask R&D and a pilot production facility.
Ziele
Saxony is one of Germany’s Eastern Länder, which are covered by Objective 1 for allocations from the EU Structural Funds. The project will add to the positive network effects in making the Dresden region one of the most advanced semiconductor clusters in Europe and result directly and indirectly in the creation of several hundred new skilled jobs. EIB financing of the project is eligible under Article 267 points a) (regional development) and c) (international competitiveness of the European industry) of the EU Treaty. Furthermore, the project contributes to the innovation 2000 initiative (i2i) as formulated at the European Council meeting in Lisbon.
Kommentar(e)
Manufacture of photomasks.
Sektor(en)
Vorgeschlagene EIB-Finanzierung (voraussichtlicher Betrag)
EUR 195 million
Gesamtkosten (voraussichtlicher Betrag)
Approx. EUR 400 million
Umweltaspekte
The project activity does not fall under the EU’s EIA Directive but is subject to national legislation. Moreover, the new manufacturing plant will be located in an existing industrial area, which is already qualified for meeting environmental regulations.
Auftragsvergabe
Promoter’s procurement procedures will be in line with current practice in private industry.
Projektstatus
Unterzeichnet - 30/08/2005
Haftungsausschluss
Bis Finanzierungen vom Verwaltungsrat genehmigt und anschließend unterzeichnet werden, befinden sich die Projekte in der Prüfungs- oder Verhandlungsphase. Die Angaben auf dieser Seite sind daher unverbindlich.
Sie dienen lediglich der Transparenz und stellen nicht die offizielle EIB-Politik dar (vgl. auch die erklärenden Anmerkungen).